By Chinmay K. Maiti
This should be the 1st publication that offers in most cases with the 3D know-how computer-aided layout (TCAD) simulations of significant state of the art pressure- and strain-engineered complex semiconductor units: MOSFETs, BJTs, HBTs, nonclassical MOS units, finFETs, silicon-germanium hetero-FETs, sun cells, strength units, and reminiscence units. The publication specializes in the right way to organize 3D TCAD simulation instruments, from masks structure to method and machine simulation, together with layout for production (DFM), and from gadget modeling to SPICE parameter extraction. The ebook additionally bargains an leading edge and new method of instructing the basics of semiconductor technique and machine layout utilizing complex TCAD simulations of varied semiconductor buildings. The simulation examples selected are from the preferred units in use this day and supply helpful know-how and gadget physics insights. to increase the function of TCAD in today’s complicated know-how period, strategy compact modeling and DFM concerns were integrated for design–technology interface generation.
Unique in method, this publication presents an built-in view of silicon expertise and beyond―with emphasis on TCAD simulations. it's the first ebook to supply an internet on-line laboratory for semiconductor equipment characterization and SPICE parameter extraction. It describes not just the producing perform linked to the applied sciences used but in addition the underlying clinical foundation for these applied sciences. Written from an engineering point of view, this booklet offers the method layout and simulation history had to comprehend new and destiny expertise improvement, method modeling, and layout of nanoscale transistors.
The publication additionally advances the knowledge and information of contemporary IC layout through TCAD, improves the standard in micro- and nanoelectronics R&D, and helps the educational of semiconductor experts. it truly is meant as a textbook or reference for graduate scholars within the box of semiconductor fabrication and as a reference for engineers excited by VLSI know-how improvement who've to resolve equipment and strategy difficulties. CAD experts also will locate this booklet priceless because it discusses the association of the simulation approach, as well as featuring many case experiences the place the consumer applies TCAD instruments in numerous situations.
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Extra resources for Introducing technology computer-aided design (TCAD) : fundamentals, simulations and applications
TCAD products should enable users to explore and optimize easily the broad spectrum of process and device alternatives and provide improvement in parametric yield modeling in manufacturing. Integrated TCAD should address all phases of the product development life cycle: (a) research and development to explore the physical limits of processes and devices for technology development, (b) product integration to optimize process and device performance, and (c) manufacturing to control process variability, Silvaco Tool Overview thereby increasing parametric yield.
Intuitive physical analyses yield valuable insights and allow easy and qualitative comparison of the different device structures. In this chapter, advanced devices such as ultrathin-body silicon-on-insulator (UTBSOI), high-electronmobility transistors, AlGaN/GaN HFETs, and high-power SiC devices are considered. 18 Memory Devices Nonvolatile semiconductor memory is an increasingly popular type of semiconductor memory because of its ability to retain data without external power. Because of its high-performance capabilities and applications in a wide range of popular consumer products, Flash memory is a very important member of the nonvolatile semiconductor memory family.
To perform a 3D simulation, one needs the mask-layout for all the process steps. The mask layout can be designed in a variety of drafting tools and specialized EDA tools like Cadence Virtuoso and Tanner L-Edit. These tools are used to create a GDSII file which is the current industry standard for IC layout work. Silvaco MaskEditor may be used to import GDSII files. If GDSII files are not available, MaskEditor may be used to create the geometric shapes and layers used in the process simulation. The 3D process simulator takes the input files created by MaskEditor and performs 3D process simulation and export the device structure to the device simulator.